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sponsored by Molecular Imprints, Inc.
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Posted:
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30 Jan 2004
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Published:
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01 Dec 2003
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Format:
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PDF
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Length:
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2
Page(s)
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Type:
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Product Literature
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Language:
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English
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ABSTRACT:
The Imprio™ 100 represents the next generation in nano-lithography. This advanced tool is based on the unique Step and Flash Imprint Lithography technology called S-FIL™.
The Imprio 100 delivers high-resolution, sub-micron alignment, and 3-dimensional replication, to customers seeking cost-effective sub-50nm lithography. This tool was built to semiconductor standards around a core platform, using the latest technology for a production lithography system. Designed to grow to full factory automation, this tool contains a better than ISO Class 1 mini-environment, a high performance wafer stage, and a semi-automatic wafer and template loader.
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BROWSE RELATED
RESOURCES
Industrial Equipment | Manufacturing Systems | Semiconductors
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sponsored by Molecular Imprints, Inc.
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BROWSE RELATED PRODUCTS:
Hardware
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