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Product Description
The Imprio™ 50 is an entry level tool based on the unique Step and Flash Imprint Lithography technology called S-FIL™. The Imprio 50 delivers high resolution capability and 3-dimensional replication to customers seeking a low cost, sub-50nm lithography tool. The Imprio 50 is the perfect "e-beam" amplifier. E-beam systems can now be used as pattern generators to create imprint templates, which inturn, enable researchers to replicate critical experimental structures in minutes, with S-FIL, rather than in days with e-beam lithography.
Type: Hardware
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Product Information:
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